Professor Seiji Samukawa at Institute of Fluid Science, Tohoku University was honored with Fellow of the Society by American Vacuum Society (AVS). This membership level designated "Fellow of the Society" is awarded to members who have made sustained and outstanding technical contributions in areas of the following: biomaterials, environmental science and technology, thin film technology, vacuum technology, plasma science and technology, and so on.

The professor’s achievement is in Development of innovative plasma sources and damages free pulsed plasma processing techniques. This research results show a new method of high accuracy plasma etching process that is a key technology in semiconductor device manufacturing. The new method helps explain damages to the board caused by plasma etching process, and minimize them.

The ceremony will be held at AVS Symposium in San Jose, California on November 11, 2009.

[Contact]
Professor Seiji Samukara
Intelligent Nano-Process Lab.,
Transdisciplinary Fluid Integration Research Center,
Institute of Fluid Science, Tohoku University