The research group led by Assistant Professor Mitsunori Toyoda of Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, in cooperation with University of Hyogo and EUVL Infrastructure Development Center Co., Ltd has successfully observed the 16nm node mask for EUV lithography in high spatial resolution with an original multilayer film mirror microscope. By the use of this microscope, the evaluation of the effects of minute defects on the 16nm node mask during the printing of microcircuit patterns has been made possible for the first time.

More information (Japanese)

[Contact]

Assistant Professor Mitsunori Toyoda

Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

E-mail: toyoda*tagen.tohoku.ac.jp (Replace * with @)

TEL: +81-22-217-5378

Technical Staff Toshiyuki Kakudate

Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

E-mail: kakudate*tagen.tohoku.ac.jp (Replace * with @)

TEL: +81-22-217-5378